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Scientific paper - Original scientific paper
Silicon surface irradiated by nitrogen laser radiation
Fizika A, 6 (1997), 2; 97-102. urn:nbn:hr:217:080049
Henč-Bartolić, Višnja; Andreić, Željko; Gracin, Davor; Kunze, Hans-Joachim; Stubičar, Mirko

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Henč Bartolić, V., Andreić, Ž., Gracin, D., Kunze, H. J. & Stubičar, M. (1997). Silicon surface irradiated by nitrogen laser radiation. Fizika A, 6. (2), 97-102. Retrieved from https://urn.nsk.hr/urn:nbn:hr:217:080049

Henč Bartolić, Višnja, et al. "Silicon surface irradiated by nitrogen laser radiation." Fizika A, vol. 6, no. 2, 1997, pp. 97-102. https://urn.nsk.hr/urn:nbn:hr:217:080049

Henč Bartolić, Višnja, Željko Andreić, Davor Gracin, Hans Joachim Kunze and Mirko Stubičar. "Silicon surface irradiated by nitrogen laser radiation." Fizika A 6, no. 2 (1997): 97-102. https://urn.nsk.hr/urn:nbn:hr:217:080049

Henč Bartolić, V., et al. (1997) 'Silicon surface irradiated by nitrogen laser radiation', Fizika A, 6(2), pp. 97-102. Available at: https://urn.nsk.hr/urn:nbn:hr:217:080049 (Accessed 19 April 2024)

Henč Bartolić V, Andreić Ž, Gracin D, Kunze HJ, Stubičar M. Silicon surface irradiated by nitrogen laser radiation. Fizika A [Internet]. 1997 [cited 2024 April 19];6(2):97-102. Available at: https://urn.nsk.hr/urn:nbn:hr:217:080049

V. Henč Bartolić, Ž. Andreić, D. Gracin, H. J. Kunze and M. Stubičar, "Silicon surface irradiated by nitrogen laser radiation", Fizika A, vol. 6, no. 2, pp. 97-102, 1997. [Online]. Available at: https://urn.nsk.hr/urn:nbn:hr:217:080049. [Accessed: 19 April 2024]

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Metadata
Title (english)Silicon surface irradiated by nitrogen laser radiation
AuthorVišnja Henč-Bartolić
AuthorŽeljko Andreić
AuthorDavor Gracin
AuthorHans-Joachim Kunze
AuthorMirko Stubičar
Author's institutionUniversity of Zagreb
Faculty of Science
(Department of Physics)
Scientific / art field,
discipline and subdiscipline		NATURAL SCIENCES
Physics
Abstract (english)
Monocrystalline silicon target was irradiated with a nitrogen laser beam (alfa = 337 nm, maximum energy density 1.1 J/cm^2, pulse duration 6 ns and repetition rate 0.2 Hz). The plasma formed at the silicon surface was observed spetroscopically in air (n_e = 3×10^18 cm^-3, T_e = 18 500 K) and in vacuum (n_e = 6.5×10^17 cm^-3, T_e = 16 000 K). The irradiated surface in vacuum was studied by a metallographic microscope. Droplets were created at crater edges. Their formation is explained by the hydrodynamical sputtering model.
Languageenglish
Publication typeScientific paper - Original scientific paper
Publication statusPublished
Peer reviewPeer review
Publication versionPublished version
Journal titleFizika A
Numberingvol. 6, no. 2, pp. 97-102
p-ISSN1330-0008
URN:NBNurn:nbn:hr:217:080049
Publication1997
Document URLhttp://fizika.hfd.hr/fizika_a/av97/a6p097.htm
Type of resourceText
Access conditionsOpen access
Terms of useLicence In copyright icon
Created on2019-10-04 15:02:40